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SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

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SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

Brand Name : ZMSH

Model Number : SiC Ceramic Tray/Plate/Wafer

Place of Origin : China

MOQ : 25

Price : undetermined

Payment Terms : T/T

Supply Ability : 1000pcs/week

Delivery Time : 2-4weeks

Packaging Details : foamed plastic+carton

Thermal Conductivity : Excellent heat dissipation, ensures uniform temperature control in high-temperature processes.

High-Temperature Stability : Can withstand temperatures up to 2,700°C, making it ideal for high-heat environments.

Wear Resistance : High hardness and durability, ideal for repeated handling and mechanical stress.

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SiC Ceramic Tray/Plate/Wafer Holder for ICP Etching Process Used in Epitaxial Growth Processing

Abstract of SiC (Silicon Carbide) Ceramic Trays

Silicon carbide (SiC) ceramic trays are high-performance materials widely used in industries that require durability, high-temperature stability, and excellent thermal conductivity. SiC ceramics, known for their superior hardness, wear resistance, chemical inertness, and thermal shock resistance, make them ideal for demanding applications such as semiconductor manufacturing, materials handling, and high-temperature processes. These trays are particularly well-suited for use in semiconductor fabrication processes like ICP (Inductively Coupled Plasma) etching and epitaxial growth, where precise temperature control and material integrity are critical.


SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

Properties of SiC Ceramic Trays

SiC ceramic trays are designed to meet the high standards required in industries such as semiconductor manufacturing and material handling. Below are the key properties of SiC ceramic trays:

1.High Thermal Conductivity

SiC has one of the highest thermal conductivities among ceramics. This allows SiC ceramic trays to efficiently dissipate heat during high-temperature processes. In industries like semiconductor etching and epitaxial growth, where precise temperature control is critical, SiC’s thermal conductivity ensures that the material can withstand and operate at elevated temperatures without degrading.

2. Excellent Wear Resistance

The inherent hardness of SiC gives it outstanding resistance to wear and abrasion. This is particularly important in environments where the trays are subjected to mechanical stress, such as in wafer handling, transportation, or substrate processing. SiC trays are durable and long-lasting, making them a reliable choice for repeated use in industrial applications.

3. Corrosion and Chemical Resistance

SiC is highly resistant to corrosion and chemical attack, making it suitable for use in environments where other materials might degrade. This includes exposure to aggressive acids, alkalis, and other corrosive substances commonly found in semiconductor etching processes or chemical processing.

4. High Temperature Stability

SiC maintains its structural integrity even at extremely high temperatures. With a melting point of around 2,700°C, SiC ceramic trays can withstand the high temperatures encountered in processes like ICP (Inductively Coupled Plasma) etching and epitaxial growth, which often operate at temperatures upwards of 1,000°C. This high-temperature tolerance ensures that SiC trays do not warp or deform under extreme conditions.

5. Electrical Insulation

SiC ceramics are electrically insulating, which makes them ideal for use in semiconductor processing environments, where electrical properties are crucial. In certain applications, such as the handling of wafers during deposition or etching, the electrical insulation properties of SiC can help prevent unwanted electrical interference.

SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing


Applications of SiC Ceramic Trays

SiC ceramic trays are used in a variety of industries, particularly those that require high-temperature stability, wear resistance, and chemical resilience. Below are some of the primary applications:

1. Semiconductor Industry

In the semiconductor industry, SiC ceramic trays are used extensively for wafer handling, particularly in the etching and epitaxial growth processes. ICP etching, a widely used technique for patterning thin films, requires precise control over temperature and material integrity. SiC trays are ideal for this process, as they provide excellent thermal management, minimizing heat-related damage to the wafers.

SiC trays are also essential in the epitaxial growth process, where thin layers of material are deposited onto a substrate. The high thermal conductivity of SiC helps maintain an even temperature distribution, which is crucial for achieving uniform growth and high-quality layers on silicon carbide or silicon wafers.

2. Materials Handling

SiC ceramic trays are used in the handling and transportation of materials in high-temperature environments. For example, they are used in the production of high-performance ceramics, metals, and composites, where other materials might fail due to thermal expansion or chemical interaction. SiC trays provide a robust solution for moving materials in furnaces, kilns, and other extreme environments.

3. LED and Solar Cell Production

SiC’s properties are particularly valuable in the production of LEDs and solar cells. During the manufacturing process of LEDs, wafers are subjected to high temperatures and mechanical stress, making SiC ceramic trays an ideal material for handling and supporting the substrates during various stages of production. Similarly, in the manufacturing of solar cells, SiC trays are used to handle wafers during processes such as doping and etching.

SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

4. Aerospace and Automotive

SiC ceramic trays are also used in aerospace and automotive applications where high-temperature performance is critical. Components that must withstand extreme conditions—such as those found in turbines, rocket engines, and high-performance braking systems—benefit from the use of SiC-based materials. These trays support the handling and processing of materials that need to be kept at specific temperatures and environments during manufacturing or testing.

SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing


Benefits of SiC Ceramic Trays

1. Increased Efficiency

The high thermal conductivity of SiC ensures that heat is efficiently dissipated, preventing thermal damage to sensitive components during processes like etching and growth. This leads to more precise and consistent results, increasing the overall efficiency of production lines.

2. Cost-Effective

Although SiC is a premium material, its durability and long lifespan reduce the need for frequent replacements. This makes SiC ceramic trays a cost-effective option in the long run, as their longevity and performance help reduce downtime and maintenance costs.

3. Enhanced Process Control

The use of SiC trays in high-temperature and semiconductor processing applications allows for better control over the environment, ensuring that the wafers or substrates are subjected to optimal conditions. This leads to better-quality products, which is especially important in industries like semiconductor manufacturing, where precision and quality are paramount.

4. Environmental Resistance

SiC’s resistance to corrosion, oxidation, and chemical damage ensures that SiC ceramic trays can withstand the harsh conditions often encountered in semiconductor fabrication and other high-tech industries. This environmental resilience contributes to the longevity and reliability of the trays in demanding applications.

Conclusion

SiC ceramic trays represent a vital component in industries that require high-performance materials capable of enduring extreme conditions. Their exceptional thermal conductivity, wear resistance, chemical stability, and high-temperature tolerance make them indispensable in semiconductor manufacturing, materials handling, and numerous other applications. By offering increased efficiency, durability, and precision, SiC ceramic trays provide manufacturers with a reliable, long-lasting solution that helps improve process control and product quality. As industries continue to demand higher performance and more resilient materials, the use of SiC ceramic trays will only continue to grow in importance across various high-tech sectors.

Q & A

Q:Can SiC ceramic trays be customized?

A: Yes, SiC ceramic trays can be customized to meet specific requirements, including size, shape, and surface finish. Customization allows for optimal performance in particular processes, such as wafer handling, substrate transportation, or specific etching and growth conditions.

#Silicon Carbide (SiC) #Ceramic Trays #High-Temperature Materials #Semiconductor Manufacturing #ICP Etching #Epitaxial Growth

#Wear Resistance #Thermal Conductivity #Chemical Resistance #Material Handling


Product Tags:

ICP Etching Process Ceramic Tray

      

Epitaxial Growth Processing Ceramic Tray

      

Epitaxial Growth Processing Ceramic Plate

      
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